Thin Solid Films

Preparation and characterization of luminescent nanocomposite film containing polyoxometalate
pp. 161-166(6)
Authors: Ma H.; Peng J.; Han Z.; Feng Y.; Wang E.

Thin molybdenum oxide films produced by molybdenum pentacarbonyl 1-methylbutylisonitrile with plasma-assisted chemical vapor deposition
pp. 167-171(5)
Authors: Hamelmann F.; Brechling A.; Aschentrup A.; Heinzmann U.; Jutzi P.; Sandrock J.; Siemeling U.; Ivanova T.; Szekeres A.; Gesheva K.

Atomic layer deposition of thin films of ZnSe-structural and optical characterization
pp. 172-177(6)
Authors: Guziewicz E.; Godlewski M.; Kopalko K.; Lusakowska E.; Dynowska E.; Guziewicz M.; Godlewski M.M.; Phillips M.

Deposition of particulate-free thin films by two synchronised laser sources: effects of ambient gas pressure and laser fluence
pp. 178-183(6)
Authors: Gyorgy E.; Mihailescu I.N.; Kompitsas M.; Giannoudakos A.

Texture evolution of transition-metal nitride thin films by ion beam assisted deposition
pp. 184-193(10)
Authors: Ma C.-H.; Huang J.-H.; Chen H.

New electroplating method of nickel in emulsion of supercritical carbon dioxide and electroplating solution to enhance uniformity and hardness of plated film
pp. 194-199(6)
Authors: Yoshida H.; Sone M.; Wakabayashi H.; Yan H.; Abe K.; Tao X.T.; Mizushima A.; Ichihara S.; Miyata S.

Effect of the orientation on the ferroelectric-antiferroelectric behavior of sol-gel deposited (Pb,Nb)(Zr,Sn,Ti)O₃ thin films
pp. 200-204(5)
Authors: Zhai J.; Li X.; Chen H.

Comparative study of chemically synthesized and plasma polymerized pyrrole and thiophene thin films
pp. 205-217(13)
Authors: Wang J.; Neoh K.G.; Kang E.T.

Influence of dopant concentration and type of substrate on the local organization of low-pressure chemical vapour deposition in situ boron doped silicon films from silane and boron trichloride
pp. 218-226(9)
Authors: Caussat B.; Scheid E.; de Mauduit B.; Berjoan R.

Growth of aluminum nitride thin films prepared by plasma-enhanced atomic layer deposition
pp. 227-231(5)
Authors: Lee Y.J.; Kang S.-W.

Capillary rise between two TiO₂ thin-films: evaluating photo-activated wetting
pp. 232-237(6)
Authors: Kataoka S.; Anderson M.A.

Surface phase transitions upon reduction of epitaxial WO₃(100) thin films
pp. 238-247(10)
Authors: Li M.; Altman E.I.; Posadas A.; Ahn C.H.

Nondestructive characterization of surface chemical wear films via X-rays
pp. 248-257(10)
Authors: Hershberger J.; Ajayi O.O.; Fenske G.R.

Interband optical absorption in a small-radius quantized spherical film
pp. 258-263(6)
Author: Haroutyunian V.A.

The influence of erbium doping of Al-N sputtered coatings on their optical properties
pp. 264-270(7)
Authors: Oliveira J.C.; Cavaleiro A.; Vieira M.T.; Bigot L.; Garapon C.; Mugnier J.; Jacquier B.

Third-order nonlinear optical responses of nanoparticulate Co₃O₄ films
pp. 271-276(6)
Authors: Ando M.; Kadono K.; Kamada K.; Ohta K.

A chemical mechanical polishing model incorporating both the chemical and mechanical effects
pp. 277-286(10)
Authors: Qin K.; Moudgil B.; Park C.-W.

Optimized infrared switching properties in thermochromic vanadium dioxide thin films: role of deposition process and microstructure
pp. 287-295(9)
Authors: Guinneton F.; Sauques L.; Valmalette J.-C.; Cros F.; Gavarri J.-R.

Conductance switching and data-storage in oriented polymer-based devices: impedance characteristics
pp. 296-300(5)
Authors: Majumdar H.S.; Bolognesi A.; Pal A.J.

Langmuir-Blodgett films from polyaniline/ruthenium complexes as modified electrodes for detection of dopamine
pp. 301-306(6)
Authors: Ferreira M.; Dinelli L.R.; Wohnrath K.; Batista A.A.; Oliveira O.N.

Effects of oxygen pressure on the growth of pulsed laser deposited ZnO films on Si(001)
pp. 307-312(6)
Authors: Kim S.S.; Lee B.-T.

Surface instability of an annular thin film
pp. 313-317(5)
Author: Yang F.

Author Index
pp. 318-319(2)

Subject Index
pp. 320-324(5)