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Frequency response in pulsed DC reactive sputtering processes

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Keywords: Pulsed DC; Reactive sputtering

Document Type: Research Article

DOI: http://dx.doi.org/10.1016/S0040-6090(99)01116-5

Affiliations: The 9ngstrom laboratory, Uppsala university, P.O. Box 534, 751 21, Uppsala, Sweden

Publication date: April 3, 2000

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