Effects of a titanium interlayer on the formation of platinum silicides

Authors: Lee C.-K.; Hsieh C.-D.; Tseng B.-H.

Source: Thin Solid Films, Volume 303, Number 1, 15 July 1997 , pp. 232-237(6)

Publisher: Elsevier

Keywords: Depth profiling; Electron microscopy; Silicides; X-ray diffraction

Language: English

Document Type: Research article

DOI: http://dx.doi.org/10.1016/S0040-6090(96)09605-8

Affiliations: 1: Institute of Materials Science and Engineering, National Sun Yat-Sen University, Kaohsiung 8042, Taiwan

Publication date: 1997-07-15

• In this: publication
• By this: publisher
• In this Subject: Electrical & Nuclear Engineering ,  Nuclear Physics
• By this author: Lee C.-K. ;  Hsieh C.-D. ;  Tseng B.-H.

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