Deposition of BaTiO3 thin films by plasma MOCVD

Authors: Chiba T.1; Itoh K.-I.; Matsumoto O.

Source: Thin Solid Films, Volume 300, Number 1, 28 May 1997 , pp. 6-10(5)

Publisher: Elsevier

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Keywords: Dielectric properties; Organometallic vapor deposition; Plasma processing and deposition; Surface and interface states

Language: English

Document Type: Research article

DOI: 10.1016/S0040-6090(96)09506-5

Affiliations: 1: Department of Chemistry, Aoyama Gakuin University, Chitosedai, Setagaya-ku, Tokyo 157, Japan

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