Deposition of BaTiO₃ thin films by plasma MOCVD

Authors: Chiba T.¹; Itoh K.-I.; Matsumoto O.

Source: Thin Solid Films, Volume 300, Number 1, 28 May 1997 , pp. 6-10(5)

Publisher: Elsevier

Keywords: Dielectric properties; Organometallic vapor deposition; Plasma processing and deposition; Surface and interface states

Language: English

Document Type: Research article

DOI: 10.1016/S0040-6090(96)09506-5

Affiliations: 1: Department of Chemistry, Aoyama Gakuin University, Chitosedai, Setagaya-ku, Tokyo 157, Japan

Links for this article

http://www.ingentaconnect.com/els/00406090/1997/00000300/00000001/art09506
http://openurl.ingenta.com/content?genre=article&issn=0040-6090&volume=300&issue=1&spage=6&epage=10
http://dx.doi.org/10.1016/S0040-6090(96)09506-5

Deposition of BaTiO3 thin films by plasma MOCVD