Deposition of BaTiO₃ thin films by plasma MOCVD

Authors: Chiba T.; Itoh K.-I.; Matsumoto O.

Source: Thin Solid Films, Volume 300, Number 1, 28 May 1997 , pp. 6-10(5)

Publisher: Elsevier

Keywords: Dielectric properties; Organometallic vapor deposition; Plasma processing and deposition; Surface and interface states

Language: English

Document Type: Research article

DOI: http://dx.doi.org/10.1016/S0040-6090(96)09506-5

Affiliations: 1: Department of Chemistry, Aoyama Gakuin University, Chitosedai, Setagaya-ku, Tokyo 157, Japan

Publication date: 1997-05-28

• In this: publication
• By this: publisher
• In this Subject: Electrical & Nuclear Engineering ,  Nuclear Physics
• By this author: Chiba T. ;  Itoh K.-I. ;  Matsumoto O.

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