Crystalline structures of the PbTiO₃ films prepared using the ECR PECVD method

Authors: Chung S.-W.¹; Chung S.-O.; No K.; Lee W.-J.

Source: Thin Solid Films, Volume 295, Number 1, 28 February 1997 , pp. 299-304(6)

Publisher: Elsevier

Keywords: Plasma processing and deposition; Chemical vapor deposition; Crystallization; X-ray diffraction

Language: English

Document Type: Research article

DOI: 10.1016/S0040-6090(96)09272-3

Affiliations: 1: Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology, Taejon 305-701, South Korea

Links for this article

http://www.ingentaconnect.com/els/00406090/1997/00000295/00000001/art09272
http://openurl.ingenta.com/content?genre=article&issn=0040-6090&volume=295&issue=1&spage=299&epage=304
http://dx.doi.org/10.1016/S0040-6090(96)09272-3

Crystalline structures of the PbTiO3 films prepared using the ECR PECVD method