Crystalline structures of the PbTiO₃ films prepared using the ECR PECVD method

Authors: Chung S.-W.; Chung S.-O.; No K.; Lee W.-J.

Source: Thin Solid Films, Volume 295, Number 1, 28 February 1997 , pp. 299-304(6)

Publisher: Elsevier

Keywords: Plasma processing and deposition; Chemical vapor deposition; Crystallization; X-ray diffraction

Language: English

Document Type: Research article

DOI: http://dx.doi.org/10.1016/S0040-6090(96)09272-3

Affiliations: 1: Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology, Taejon 305-701, South Korea

Publication date: 1997-02-28

• In this: publication
• By this: publisher
• In this Subject: Electrical & Nuclear Engineering ,  Nuclear Physics
• By this author: Chung S.-W. ;  Chung S.-O. ;  No K. ;  Lee W.-J.

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