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Volume 257, Number 1, September 2003

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Editorial Board
pp. ii-ii(1)

In-plane epitaxial relationships between a-plane sapphire substrates and GaN layers grown by different techniques
pp. 1-6(6)
Authors: Paskova T.; Darakchieva V.; Valcheva E.; Paskov P.P.; Monemar B.; Heuken M.

Physical modelling of the melt flow during large-diameter silicon single crystal growth
pp. 7-18(12)
Authors: Gorbunov L.; Pedchenko A.; Feodorov A.; Tomzig E.; Virbulis J.; Ammon W.V.

Growth kinetics of Si on fullsheet, patterned and silicon-on-insulator substrates
pp. 19-30(12)
Authors: Hartmann J.M.; Abbadie A.; Vinet M.; Clavelier L.; Holliger P.; Lafond D.; Semeria M.N.; Gentile P.

Detailed X-ray diffraction studies on optically pumped mid-infrared InAs/Ga(In)Sb/AlSb type-II lasers
pp. 42-50(9)
Authors: Hoffmann G.; Schimper H.J.; Schwender C.; Herhammer N.; West G.F.; Vogelgesang B.; Drumm J.O.; Fouckhardt H.; Scheib M.

Influence of twinned structure on the morphology of CdTe(111) layers grown by MOCVD on GaAs(100) substrates
pp. 60-68(9)
Authors: Mora-Sero I.; Polop C.; Ocal C.; Aguilo M.; Munoz-Sanjose V.

H2-assisted control growth of Si nanowires
pp. 69-74(6)
Authors: Yan X.Q.; Liu D.F.; Ci L.J.; Wang J.X.; Zhou Z.P.; Yuan H.J.; Song L.; Gao Y.; Liu L.F.; Zhou W.Y.; Wang G.; Xie S.S.

Influence of nitrogen doping on the properties of 4H-SiC single crystals grown by physical vapor transport
pp. 75-83(9)
Authors: Rost H.-J.; Doerschel J.; Irmscher K.; Schulz D.; Siche D.

Preparation and luminescent characteristics of Mn2+, Er3+ co-doped ZrO2 nanocrystals
pp. 84-88(5)
Authors: Wang S.F.; Gu F.; Lu M.K.; Zhou G.J.; Ai Z.P.; Xu D.; Yuan D.R.

Using As/P exchange processes to modify InAs/InP quantum dots
pp. 89-96(8)
Authors: Poole P.J.; Williams R.L.; Lefebvre J.; Moisa S.

Growth of GaN nanowires on Si substrate using Ni catalyst in vertical chemical vapor deposition reactor
pp. 97-103(7)
Authors: Kim T.Y.; Lee S.H.; Mo Y.H.; Shim H.W.; Nahm K.S.; Suh E.-K.; Yang J.W.; Lim K.Y.; Park G.S.

Formation of InAs islands on InP(311)B surface by molecular beam epitaxy
pp. 104-109(6)
Authors: Paranthoen C.; Bertru N.; Platz C.; Caroff P.; Dehaese O.; Folliot H.; Le Corre A.; Loualiche S.

Low-temperature growth of aluminum nitride on sapphire substrates
pp. 123-128(6)
Authors: Guo Q.X.; Yahata K.; Tanaka T.; Nishio M.; Ogawa H.

Crystal growth and spectroscopic properties of Er:La3Ga5SiO14 single crystals
pp. 141-145(5)
Authors: Wang Z.; Yuan D.; Shi X.; Cheng X.; Xu D.; Lv M.; Pan L.; Guo S.

Growth and structure of SrAl0.5Ta0.5O3:LaAlO3 solid solutions single crystals
pp. 146-152(7)
Authors: Berkowski M.; Fink-Finowicki J.; Diduszko R.; Byszewski P.; Aleksiyko R.; Kikalejshvili-Domukhovska R.

RF-plasma enhanced CVD of TiSi2 thin films: effects of TiCl4 flow rate and RF power
pp. 153-160(8)
Authors: Fouad O.A.; Uddin N.M.; Yamazato M.; Nagano M.

Growth and optical properties of Zn:KLN single crystal
pp. 161-164(4)
Authors: Yang C.H.; Guo Y.J.; Li J.L.; Wang B.

Optical properties of a new nonlinear borate crystal LiRbB4O7
pp. 165-168(4)
Authors: Komatsu R.; Ono Y.; Kajitani T.; Rotermund F.; Petrov V.

Growth of Cu-doped Li2B4O7 single crystals by vertical Bridgman method and their characterization
pp. 169-176(8)
Authors: Ishii M.; Kuwano Y.; Asai T.; Senguttuvan N.; Hayashi T.; Kobayashi M.; Oku T.; Sakai K.; Adachi T.; Shimizu H.M.; Suzuki J.

PbTe/CdTe single quantum wells grown on GaAs (100) substrates by molecular beam epitaxy
pp. 212-217(6)
Authors: Koike K.; Honden T.; Makabe I.; Yan F.P.; Yano M.

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