Characterization of beryllium doped Al0.33Ga0.67As layers grown by molecular beam epitaxy
Authors: Zheng H.Q.1; Radhakrishnan K.; Wang H.; Zhang P.H.; Yoon S.F.; Ng G.I.
Source: Journal of Crystal Growth, Volume 197, Number 4, 1 March 1999 , pp. 762-768(7)
Publisher: Elsevier
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Keywords: Beryllium; Doping; AlGaAs; Photoluminescence
Language: English
Document Type: Research article
DOI: 10.1016/S0022-0248(98)01068-9
Affiliations: 1: School of Electrical and Electronics Engineering Block S1, Nanyang Technological University, Nanyang Avenue, Singapore 639798, Singapore
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