Characterization of particle contamination in process steps during plasma-enhanced chemical vapor deposition operation

Authors: Setyawan H.; Shimada M.; Imajo Y.; Hayashi Y.; Okuyama K.

Source: Journal of Aerosol Science, Volume 34, Number 7, July 2003 , pp. 923-936(14)

Publisher: Elsevier

Language: English

Document Type: Research article

DOI: http://dx.doi.org/10.1016/S0021-8502(03)00066-1

Affiliations: 1: Department of Chemical Engineering, Graduate School of Engineering, Hiroshima University, 1-4-1 Kagamiyama, 739-8527, Higashi-Hiroshima, Japan

Publication date: 2003-07-01

• In this: publication
• By this: publisher
• In this Subject: Chemical Engineering ,  Meteorology & Climatology
• By this author: Setyawan H. ;  Shimada M. ;  Imajo Y. ;  Hayashi Y. ;  Okuyama K.

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