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The effects of SiCl4 and GeCl4 oxidation, variable properties, buoyancy and tube rotation on the modified chemical vapor deposition process

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Document Type: Research Article

DOI: http://dx.doi.org/10.1016/0017-9310(94)00238-Q

Affiliations: Department of Mechanical Engineering, University of California at Berkeley, Berkeley, CA 94720, U.S.A.

Publication date: July 1, 1995

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