Electron-beam induced carbon deposition used as a mask for cadmium sulfide deposition on Si(100)
Authors: Djenizian, T.; Petite, B.; Santinacci, L.; Schmuki, P.
Source: Electrochimica Acta, Volume 47, Number 6, 14 December 2001 , pp. 891-897(7)
Document Type: Research Article
Affiliations: Department of Material Science, LKO, University of Erlangen-Nuremberg, Martensstrasze 7, D-91058 , Erlangen, Germany
Publication date: December 14, 2001