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The Conversion of Perhydropolysilazane into SiON Films Characterized by X‐Ray Photoelectron Spectroscopy

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Silicon oxynitride (SiON) films of ~1 μm thickness were made by dip coating and subsequent thermal treatment of a preceramic polymer: perhydropolysilazane (PHPS). X‐ray photoelectron spectroscopy was used to analyze the surface of a series of SiON films annealed in air between room temperature and 800°C. Results reveal that the progressive changes in the bonding states of silicon, oxygen, and nitrogen due to different degrees of annealing lead to a systematic evolution of atomic ratios of the films. It is shown that PHPS forms a unique amorphous SiO x N y material upon annealing in air up to 800°C with evolving compositions, instead of a mixture of Si3N4 and SiO2.
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Document Type: Research Article

Publication date: 2012-12-01

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