Dip‐Pen Lithography of BiFeO3 Nanodots

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Abstract:

We demonstrate the dip‐pen nanolithography (DPN) process of BiFeO3 nanodots forming a nanodot at any desired position. The BiFeO3 nanodots exhibited a size increment from 30 to 180 nm for the deposition time between 0.1 and 10 s. This position‐controlled DPN using a silicon nitride cantilever produced an array of the ferroelectric nanodots with a minimum lateral dimension of about 30 nm on a Nb‐doped SrTiO3 substrate. We further confirmed canonical ferroelectric responses of the minimum‐sized nanodot using piezoelectric force microscopy.

Document Type: Research Article

DOI: http://dx.doi.org/10.1111/jace.12008

Publication date: December 1, 2012

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