Dip‐Pen Lithography of BiFeO3 Nanodots
We demonstrate the dip‐pen nanolithography (DPN) process of BiFeO3 nanodots forming a nanodot at any desired position. The BiFeO3 nanodots exhibited a size increment from 30 to 180 nm for the deposition time
between 0.1 and 10 s. This position‐controlled DPN using a silicon nitride cantilever produced an array of the ferroelectric nanodots with a minimum lateral dimension of about 30 nm on a Nb‐doped SrTiO3 substrate.
We further confirmed canonical ferroelectric responses of the minimum‐sized nanodot using piezoelectric force microscopy.