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Textured Magnesium Titanate as Gate Oxide for GaN-Based Metal-Oxide-Semiconductor Capacitor

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Abstract:

We demonstrate the first high-permittivity ceramic oxide for use as the gate oxide of the GaN-based metal-oxide-semiconductor (MOS) capacitor. An ilmenite magnesium titanate (MgTiO3) thin film prepared by sputtering was studied. When oxygen was introduced during sputtering, the preferred orientation changed from spinel Mg2TiO4 (111) to ilmenite MgTiO3 (003). The X-ray diffractometry −2 and -scans were performed to identify the preferred films. Possible epitaxial relationships at the Mg2TiO4 (111)/GaN (001) and MgTiO3 (003)/GaN (001) interfaces were proposed. Finally, the electrical properties of the Al/MgTiO3 (003)/GaN (001)/Al MOS capacitor were presented.

Document Type: Research Article

DOI: https://doi.org/10.1111/j.1551-2916.2011.04439.x

Affiliations: Department of Electrical Engineering, National Cheng Kung University, Tainan, 70101, Taiwan

Publication date: 2011-04-01

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