Spark Plasma Sintering of Nanosized Amorphous Silicon Nitride Powder with a Small Amount of Sintering Additive
Authors: Hotta, Mikinori; Shinoura, Takanori; Enomoto, Naoya; Hojo, Junichi
Source: Journal of the American Ceramic Society, Volume 93, Number 6, June 2010 , pp. 1544-1546(3)
Abstract:Dense and fine-grained -Si3N4 ceramics were successfully obtained with a small amount of sintering additives, 1.5 mass% Y2O3 and 0.5 mass% Al2O3, using nanosized amorphous Si3N4 powder by spark plasma sintering at temperatures of 1500°–1800°C and a pressure of 30 MPa under N2. The -Si3N4 ceramics were composed of equiaxed grains with an average size of 300 nm. A higher sintering temperature was required for the densification of submicrometer-sized α-Si3N4 powder with the small amount of the additives. The use of nanosized amorphous Si3N4 powder accelerated the densification and the transformation to the -phase.
Document Type: Research Article
Affiliations: Department of Applied Chemistry, Faculty of Engineering, Kyushu University, Fukuoka 819-0395, Japan
Publication date: June 1, 2010