On-Site Fabrication of Crystalline Cerium Oxide Films and Patterns by Ink-Jet Deposition Method at Moderate Temperatures
Crystalline CeO2 films and patterns have been successfully fabricated in a “single-step process” at moderate temperature. In this process, the combination of the ink-jet technique and depositing the precursor on a hot substrate (≤300°C) gave crystalline CeO2 without further heat treatment. X-ray diffraction analysis revealed that the phase formed was crystallized ceria with nanosized (<10 nm) crystallites. The film thickness was several hundred nanometers and the pattern width was about 150 m. Scanning electron microscopy analysis showed that the films and patterns were free of cracks and adhered to the substrate. This is the first report about the direct patterning of crystalline CeO2 without postfiring or posttreatments like masking, etching, etc.
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Document Type: Research Article
Affiliations: Materials and Structures Laboratory, Tokyo Institute of Technology, 4259 Nagatsuta, Yokohama, Japan
Publication date: 2008-07-01