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Aerosol Deposition of Ceramic Thick Films at Room Temperature: Densification Mechanism of Ceramic Layers

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Abstract:

A novel method for depositing ceramic thick films by aerosol deposition (AD) is presented. Submicron ceramics particles are accelerated by gas flow up to 100–500 m/s and then impacted on a substrate, to form a dense, uniform and hard ceramic layer at room temperature. However, actual deposition mechanism has not been clarified yet. To clarify densification mechanism during AD, a mixed aerosol of α-Al2O3 and Pb(Zr, Ti)O3 powder was deposited to form a composite layer in this study. The cross-section of the layer was observed by HR-TEM to investigate the densification and bonding mechanism of ceramic particles. As a result, a plastic deformation of starting ceramic particles at room temperature was observed.

Document Type: Research Article

DOI: https://doi.org/10.1111/j.1551-2916.2006.01030.x

Affiliations: National Institute of Advanced Industrial Science and Technology, Ibaraki 305-8564, Japan

Publication date: 2006-06-01

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