Preparation and Corrosion Resistance of Amorphous SiNx Films from Hexamethyldisiloxane Solution by PECVD
Abstract:SiNx films were deposited on Si wafer and SUS steel (Fe–18Cr–8Ni) substrate from a hexamethyldisiloxane solution by N2 plasma-enhanced chemical vapor deposition equipped with a liquid injection device. The SiNx films with dense columnar structures were identified to be amorphous by means of X-ray diffraction, scanning electron microscopy, transmission electron microscopy, and X-ray photoelectron spectroscopy. An enhancement of deposition rate, in combination with a large amount of oxygen contaminant, was obtained after modifying the nozzle position from a top injection to a side injection method by providing a greater liquid supply. The corrosion performance of SiNx film-coated SUS steel was evaluated by exposure test in KCl vapor atmosphere at 650°C, indicating that the high purity SiNx film demonstrated a significantly improved resistance, while an increased remanent oxygen content inside the films produced a deleterious effect on the anti-corrosion behavior.
Document Type: Communications
Affiliations: Division of Materials and Engineering, Graduate School of Engineering, Hokkaido University, Sapporo 060-8628, Japan
Publication date: October 1, 2005