Skip to main content

Preparation and Corrosion Resistance of Amorphous SiNx Films from Hexamethyldisiloxane Solution by PECVD

Buy Article:

$48.00 plus tax (Refund Policy)


SiNx films were deposited on Si wafer and SUS steel (Fe–18Cr–8Ni) substrate from a hexamethyldisiloxane solution by N2 plasma-enhanced chemical vapor deposition equipped with a liquid injection device. The SiNx films with dense columnar structures were identified to be amorphous by means of X-ray diffraction, scanning electron microscopy, transmission electron microscopy, and X-ray photoelectron spectroscopy. An enhancement of deposition rate, in combination with a large amount of oxygen contaminant, was obtained after modifying the nozzle position from a top injection to a side injection method by providing a greater liquid supply. The corrosion performance of SiNx film-coated SUS steel was evaluated by exposure test in KCl vapor atmosphere at 650°C, indicating that the high purity SiNx film demonstrated a significantly improved resistance, while an increased remanent oxygen content inside the films produced a deleterious effect on the anti-corrosion behavior.

Document Type: Communications


Affiliations: Division of Materials and Engineering, Graduate School of Engineering, Hokkaido University, Sapporo 060-8628, Japan

Publication date: October 1, 2005


Access Key

Free Content
Free content
New Content
New content
Open Access Content
Open access content
Subscribed Content
Subscribed content
Free Trial Content
Free trial content
Cookie Policy
Cookie Policy
ingentaconnect website makes use of cookies so as to keep track of data that you have filled in. I am Happy with this Find out more