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Preparation and Corrosion Resistance of Amorphous SiNx Films from Hexamethyldisiloxane Solution by PECVD

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Abstract:

SiNx films were deposited on Si wafer and SUS steel (Fe–18Cr–8Ni) substrate from a hexamethyldisiloxane solution by N2 plasma-enhanced chemical vapor deposition equipped with a liquid injection device. The SiNx films with dense columnar structures were identified to be amorphous by means of X-ray diffraction, scanning electron microscopy, transmission electron microscopy, and X-ray photoelectron spectroscopy. An enhancement of deposition rate, in combination with a large amount of oxygen contaminant, was obtained after modifying the nozzle position from a top injection to a side injection method by providing a greater liquid supply. The corrosion performance of SiNx film-coated SUS steel was evaluated by exposure test in KCl vapor atmosphere at 650°C, indicating that the high purity SiNx film demonstrated a significantly improved resistance, while an increased remanent oxygen content inside the films produced a deleterious effect on the anti-corrosion behavior.

Document Type: Communications

DOI: http://dx.doi.org/10.1111/j.1551-2916.2005.00531.x

Affiliations: Division of Materials and Engineering, Graduate School of Engineering, Hokkaido University, Sapporo 060-8628, Japan

Publication date: October 1, 2005

bsc/jace/2005/00000088/00000010/art00051
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