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Microstructure and Creep Behavior of Silicon Nitride and SiAlONs

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Abstract:

Microstructural evolution of silicon nitride (Si3N4) and SiAlON materials and its influence on creep resistance is reviewed. Grain size, grain morphology, and the ratio of α- to -phase grains play a part in resistance to creep. The glassy, intergranular phase typically has the strongest influence on creep. Creep data are usually obtained using uniaxial tensile or compressive tests, where creep in tension is controlled by cavitation and grain boundary sliding controls creep in compression. The impression creep methodology is also reviewed. An additional creep mechanism, dilation of the SiAlON grain structure, was found to be active in impression creep.

Document Type: Research Article

DOI: http://dx.doi.org/10.1111/j.1744-7402.2008.02192.x

Affiliations: 1: Savannah River National Laboratory, Aiken, South Carolina 29808 2: Department of Materials Science and Engineering, The Pennsylvania State University, University Park, Pennsylvania 16802

Publication date: March 1, 2008

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