Skip to main content

Microstructure and Creep Behavior of Silicon Nitride and SiAlONs

Buy Article:

$51.00 plus tax (Refund Policy)

Microstructural evolution of silicon nitride (Si3N4) and SiAlON materials and its influence on creep resistance is reviewed. Grain size, grain morphology, and the ratio of α- to -phase grains play a part in resistance to creep. The glassy, intergranular phase typically has the strongest influence on creep. Creep data are usually obtained using uniaxial tensile or compressive tests, where creep in tension is controlled by cavitation and grain boundary sliding controls creep in compression. The impression creep methodology is also reviewed. An additional creep mechanism, dilation of the SiAlON grain structure, was found to be active in impression creep.
No References
No Citations
No Supplementary Data
No Data/Media
No Metrics

Document Type: Research Article

Affiliations: 1: Savannah River National Laboratory, Aiken, South Carolina 29808 2: Department of Materials Science and Engineering, The Pennsylvania State University, University Park, Pennsylvania 16802

Publication date: 2008-03-01

  • Access Key
  • Free content
  • Partial Free content
  • New content
  • Open access content
  • Partial Open access content
  • Subscribed content
  • Partial Subscribed content
  • Free trial content
Cookie Policy
X
Cookie Policy
Ingenta Connect website makes use of cookies so as to keep track of data that you have filled in. I am Happy with this Find out more