Author: Ouaked, Said

Source: International Migration, Volume 40, Number 4, September 2002 , pp. 153-166(14)

Publisher: Wiley-Blackwell

Abstract:

Globalization and the advent of the knowledge economy have created a new context where there is a greater demand for the highly skilled, especially in the information technology (IT) industry. High-skilled migration has become increasingly more complex, even if in recent years the term “brain drain” has become a generic reference to “high-skilled migration” of all types. It has also become clear that brain mobility does not automatically translate into “brain drain”, and that impacts vary by the types of skills held by migrants.

The meeting demonstrated that while much is known about high-skilled migration and its effects on source countries, there is also a great deal yet to be learned in a dynamic environment. Many participants deplored the lack of reliable data, which makes it difficult to know what is really going on and to establish appropriate policies. Clearly, there are an array of policies that can offset possible adverse effects of skilled mobility and even leverage the flow into positive outcomes for source countries. A key element is improvement of the population's general level of education. Low levels of skills keep average labour productivity and wages low and therefore retard development. Long-term strategies to promote economic growth are needed to enable developing countries to retain and draw back their highly skilled and address the negative effects of the brain drain. Migrants themselves can play an important role through their remittances, diaspora networks, and own willingness to return - at least temporarily — to share their skills and contribute to economic progress. Finally, destination countries can facilitate the process through policies that promote circulation of highly skilled migrants.

Document Type: Original article

DOI: http://dx.doi.org/10.1111/1468-2435.00209

Affiliations: 1: Georgetown University, Washington DC, USA.

Publication date: 2002-09-01

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