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Photo‐Curable Polymer Blend Dielectrics for Advancing Organic Field‐Effect Transistor Applications

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A solution method of photo‐curable and ‐patternable polymer gate dielectrics was introduced by using blend solutions of poly(4‐dimethylsilyl styrene) (PDMSS) and poly(melamine‐co‐formaldehyde) acrylate (PMFA). The fabrication was optimized to produce a smooth hydrophobic gate dielectric with good insulating and solvent‐resistant properties. On the optimized PDMSS/PMFA blend gate dielectric, pentacene could grow into highly ordered structure, showing high electric performances for the resulting OFETs, as well as PTCDI‐C13 and TES‐ADT.
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Document Type: Communications

Affiliations: 1: Polymer Research Institute, Department of Chemical Engineering, Pohang University of Science and Technology, Pohang 790-784 (Korea) 2: Department of Advanced Fiber Engineering, Division of Nano-systems Engineering, Inha University, Incheon 402-751 (Korea) 3: Department of Chemistry, University of Kentucky, KY 40506 (USA)

Publication date: 2010-11-16

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