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Recent Patents on Self-Organised Magnetic Nanodot Arrays

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As the continuous advance in the process of device miniaturisation reaches down to the nanometre range, fabrication techniques based on self-organisation, i.e., the spontaneous formation of ordered patterns on surfaces, are becoming increasingly attractive as potential, highly efficient alternatives to lithographic methods. In this article we review some of the methodologies that have been developed recently to produce ordered arrays of nanomagnets using self-organised surface templates, and we list the patents that have been filed recently to protect those fabrication procedures. We describe the underlying phenomena giving rise to the appearance of the ordered structures, and discuss their characteristics and the controllable parameters.

Keywords: Giant Magneto-Resistance; Magnetic anisotropy; Nanodot; Nanolitho-graphy methods using beams of electrons; Patents; elf-organised heteroepitaxial semiconductor nanostructures; exchange bias effect; magnetic circular dichroism; magnetic force microscopy (MFM); nanoimprint technique; nanomagnetism; nanomagnets; nanoparticles; nanosphere lithography; netic random-access memories (M-RAMs); photoemission electron mi-croscopy (PEEM); porous anodic aluminum oxide (AAO); quantum magnetic dots; self-assembly; self-organisation; sputter deposition; superparamagnetism; thermal evaporation; x-ray absorption ?ne spectra (EXAFS); “top-down” methods

Document Type: Research Article

Publication date: 2011-01-01

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  • Recent Patents on Nanotechnology publishes review articles by experts on recent patents on nanotechnology. A selection of important and recent patents on nanotechnology is also included in the journal. The journal is essential reading for all researchers involved in nanotechnology.
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