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Eliminated UV Light Emitted from Nanostructured Silica Thin Film using H2 Plasma by ICP-CVD

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Nanostructured mesoporous silica thin film has been deposited on silicon substrate by the spin-coating technique using CTAB as a template under acidic conditions. TGA, SEM, HRTEM, N2 adsorption-desorption isotherm, FTIR and synchrotron high flux beamline were used to characterize the microstructure and photoluminescence properties of the resulting film. After being calcined at 400 °C for 12 h, the thin film exhibited a very smooth surface and interconnected pores, with a pore size of about 1-2 nm. The synchrotron photoluminescence spectra show that the samples after calcination have three obvious luminescence peaks around 322, 387 and 410 nm arising from nonbridging oxygen hole centers (NBOHCs) and Si-OH surface complexes. The UV emission (322 nm) due to NBOHCs is inhibited by H2 plasma treatment, indicating that the nonbridging oxygen was saturated by the hydrogen atoms.

Keywords: H2 plasma treatment; Mesoporous silica; UV light; hydrogen atoms; nonbridging oxygen; photoluminescence; spin-coating technique; synchrotron radiation

Document Type: Research Article


Publication date: April 1, 2011

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  • Current Nanoscience publishes authoritative reviews and original research reports, written by experts in the field on all the most recent advances in nanoscience and nanotechnology. All aspects of the field are represented including nano- structures, synthesis, properties, assembly and devices. Applications of nanoscience in biotechnology, medicine, pharmaceuticals, physics, material science and electronics are also covered. The journal is essential to all involved in nanoscience and its applied areas.

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