A Review on Legacy of Chemical Vapour Deposition Grown Thin Films for Solid State H2 Sensors
Chemical Vapour Deposition (CVD) remains a key focus area for material researchers due to the excellent process controllability and the development of quality thin films produced on varieties of substrates for modern technological applications. Some modified CVD like Plasma enhanced CVD (PECVD), Atomic Layer CVD (ALCVD), Laser CVD and Metal organic CVD (MOCVD) offer the added advantages like low substrate temperature, high spatial resolution and precise doping of the samples during the deposition in addition to the high temperature stability of the films. CVD grown materials, especially oxides and other high temperature compounds are getting attention for gas sensor applications. In this review article, the hydrogen sensing performance of the CVD grown semi-conducting oxides like SnO2, ZnO, Fe2O3 and other high temperature materials like Silicon Carbide (SiC), group III-Nitrides (GaN, AlN etc.), and carbon derivatives (CNT and graphene) have been presented and discussed. The relative advantages and disadvantages of these materials for hydrogen sensors have also been discussed with an intention of predicting the possible future directions of research and development in this area.
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Document Type: Review Article
Publication date: 2011-10-01
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