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Direct Measurement of Resistance of Multiwalled Carbon Nanotubes Using Micro Four-Point Probes

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The electrical properties of multiwalled carbon nanotubes was investigated by micro four point probes, fabricated using conventional silicon microfabrication techniques. After positioning of chemical vapour deposition-grown multi-walled carbon nanotubes on a SiO2 substrate, the two- or four-point resistance at specific positions along the nanotubes, was measured by microprobes with different microelectrode spacings. Individual nanotubes were investigated in more detail by measuring current as a function of bias voltage until the point of failure and the results are compared to previously reported findings, using conventional measurement techniques.


Document Type: Research Article


Publication date: December 1, 2005

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