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Reflow of Phosphorous Silicate Glass Layer Formed on Textured Si Surface in Crystalline Si Solar Cells

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We have investigated the reflow behavior of phosphorus silicate glass (PSG) layer formed on textured Si surface using transmission electron microscopy and simulation. For conventional wet oxidation process, stress-dependent surface reaction and stress-dependent oxidant diffusion led to the oxidation retardation in both convex and concave regions of the textured Si surface, respectively. However, PSG film formed by POCl3-diffusion underwent reflow, resulting in the formations of thinner and thicker PSG films in convex and concave regions, respectively. Simulation results showed that the reflow of PSG films causes lateral thermal mismatch stresses to increase and decrease in convex and concave regions, respectively.

Document Type: Research Article


Publication date: July 1, 2012

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  • Journal for Nanoscience and Nanotechnology (JNN) is an international and multidisciplinary peer-reviewed journal with a wide-ranging coverage, consolidating research activities in all areas of nanoscience and nanotechnology into a single and unique reference source. JNN is the first cross-disciplinary journal to publish original full research articles, rapid communications of important new scientific and technological findings, timely state-of-the-art reviews with author's photo and short biography, and current research news encompassing the fundamental and applied research in all disciplines of science, engineering and medicine.
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