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Pattern Uniformity in Large-Area Ultraviolet Nano-Imprinting by a Cylindrically Inflated Flexible Mold Under Low Pressure

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This paper shows a novel nano-imprint method with a polydimethylsiloxane (PDMS) replica mold that was bonded on a cylindrically inflated polycarbonate (PC) film via a low air pressure. The PDMS mold, which was deformed in terms of its cylindrical shape, made a line contact with a substrate from the center region and the contact region, then expanded gradually to the outside of the substrate when the contact force increased. This contact procedure squeezed the resin that was dropped on the substrate from the center to the outside, which prevented the trapping of air bubbles while the cavities were filled with the patterns on the PDMS mold. The main characteristic of the proposed process was that the nano-imprint can be realized under a low pressure, compared to conventional processes. We will show the system that was implemented under the proposed process concept and the patterns that were transferred in an ultraviolet curable resin under pressure conditions of less than 5 kPa.
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Document Type: Research Article

Publication date: 2012-07-01

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  • Journal for Nanoscience and Nanotechnology (JNN) is an international and multidisciplinary peer-reviewed journal with a wide-ranging coverage, consolidating research activities in all areas of nanoscience and nanotechnology into a single and unique reference source. JNN is the first cross-disciplinary journal to publish original full research articles, rapid communications of important new scientific and technological findings, timely state-of-the-art reviews with author's photo and short biography, and current research news encompassing the fundamental and applied research in all disciplines of science, engineering and medicine.
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