Characteristics of Nanostructured ZnO Layers Deposited in Spray Plasma Device

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Abstract:

ZnO and Al doped ZnO thin film have been deposited on glass substrate by “spray plasma” process using an aqueous solution of Zn(NO3)2. XRD patterns revealed polycrystalline character with the typical hexagonal w├╝rtzite structure. The preferential c-axis orientation of crystallites depends highly on the operating conditions. Willamson-Hall method and AFM photographs showed a size of crystallites ranging between 20 and 80 nm and a roughness between 6 and 50 nm. Films exhibit a transmittance between 65 and 90% in the visible region. XPS revealed that the stoichiometry of deposited ZnO is Zn/O = 0.93. Fluorescence spectroscopy showed the presence of two bands at 360 nm (UV) and at 410 nm (Blue). The UV band can be attributed to exiton emission. Another important result concerns the non-existence of a “green” band at 500 nm.

Document Type: Research Article

DOI: http://dx.doi.org/10.1166/jnn.2012.4910

Publication date: June 1, 2012

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  • Journal for Nanoscience and Nanotechnology (JNN) is an international and multidisciplinary peer-reviewed journal with a wide-ranging coverage, consolidating research activities in all areas of nanoscience and nanotechnology into a single and unique reference source. JNN is the first cross-disciplinary journal to publish original full research articles, rapid communications of important new scientific and technological findings, timely state-of-the-art reviews with author's photo and short biography, and current research news encompassing the fundamental and applied research in all disciplines of science, engineering and medicine.
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