Characteristics of Nanostructured ZnO Layers Deposited in Spray Plasma Device
Abstract:ZnO and Al doped ZnO thin film have been deposited on glass substrate by “spray plasma” process using an aqueous solution of Zn(NO3)2. XRD patterns revealed polycrystalline character with the typical hexagonal würtzite structure. The preferential c-axis orientation of crystallites depends highly on the operating conditions. Willamson-Hall method and AFM photographs showed a size of crystallites ranging between 20 and 80 nm and a roughness between 6 and 50 nm. Films exhibit a transmittance between 65 and 90% in the visible region. XPS revealed that the stoichiometry of deposited ZnO is Zn/O = 0.93. Fluorescence spectroscopy showed the presence of two bands at 360 nm (UV) and at 410 nm (Blue). The UV band can be attributed to exiton emission. Another important result concerns the non-existence of a “green” band at 500 nm.
Document Type: Research Article
Publication date: 2012-06-01
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