Surface Patterning of Glass via Electrostatic Imprinting Using a Platinum Mold

Authors: Youn, Sung-Won; Takagi, Hideki; Park, Sang-Cheon; Takahashi, Masaharu; Maeda, Ryutaro

Source: Journal of Nanoscience and Nanotechnology, Volume 12, Number 4, April 2012 , pp. 3181-3185(5)

Publisher: American Scientific Publishers

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Electrostatic imprinting is a highly suitable process for patterning large area and high efficiency glasses because it enables glass patterning at low temperatures with low pressures. Because high DC voltage bias is applied to the mold and glass during the thermal imprinting, the mold materials should have electrical conductivity, appropriate glass adhesion properties, and excellent thermal and electrochemical stability. In this study, thin Pt/Ni molds were fabricated via Si micromachining and electroforming techniques and were then used in the electrostatic imprint process in order to evaluate their feasibility as molds. Under the investigated process conditions, the pattern transfer to glass was accomplished without noticeable degradation of the mold. Furthermore, the process parameter effects on replication fidelity and potential defects were investigated.

Document Type: Research Article


Publication date: April 1, 2012

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  • Journal for Nanoscience and Nanotechnology (JNN) is an international and multidisciplinary peer-reviewed journal with a wide-ranging coverage, consolidating research activities in all areas of nanoscience and nanotechnology into a single and unique reference source. JNN is the first cross-disciplinary journal to publish original full research articles, rapid communications of important new scientific and technological findings, timely state-of-the-art reviews with author's photo and short biography, and current research news encompassing the fundamental and applied research in all disciplines of science, engineering and medicine.
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