Optical Properties of Electrochemically Deposited ZnO Thin Films on Colloidal Crystal Film of SiO2 Microspheres
The optical properties of electrochemically deposited ZnO thin films on colloidal crystal film of SiO2 microspheres structures were studied. Colloidal crystal film of SiO2 microspheres were self-assembled by evaporation using SiO2 in solution at a constant 0.1 wt%. ZnO in thin films was then electrochemically deposited on to colloidal crystal film of SiO2 microspheres. During electrochemical deposition, the content of Zn(NO3)2·6H2O in solution was 5 wt%, and the process's conditions were varied between of 2–4 V and 30–120 s at room temperature, with subsequent heat-treatment between 200 and 400 °C. A smooth surface and uniform thickness of 1.8 m were obtained at 3 V for 90 s. The highest PL peak intensity was obtained in the ZnO thin film heat-treated at 400 °C. The double layered ZnO/SiO2 colloidal crystals showed clearly better emission properties than the SiO2/ZnO and ZnO structures.
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Document Type: Research Article
Publication date: 2012-02-01
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