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Catalyst-Free Metal-Organic Chemical Vapor Deposition Growth of InN Nanorods

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Abstract:

We demonstrated the successful growth of catalyst-free InN nanorods on (0001) Al2O3 substrates using metal-organic chemical vapor deposition. Morphological evolution was significantly affected by growth temperature. At 710 °C, complete InN nanorods with typical diameters of 150 nm and length of ∼3.5 μm were grown with hexagonal facets. –2 X-ray diffraction measurement shows that (0002) InN nanorods grown on (0001) Al2O3 substrates were vertically aligned along c-axis. In addition, high resolution transmission electron microscopy indicates the spacing of the (0001) lattice planes is 0.28 nm, which is very close to that of bulk InN. The electron diffraction patterns also revealed that the InN nanorods are single crystalline with a growth direction along 〈0001〉 with (10–10) facets.

Keywords: CATALYST-FREE; INN NANOROD; METAL-ORGANIC CHEMICAL VAPOR DEPOSITION (MOCVD)

Document Type: Research Article

DOI: http://dx.doi.org/10.1166/jnn.2012.4698

Publication date: February 1, 2012

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  • Journal for Nanoscience and Nanotechnology (JNN) is an international and multidisciplinary peer-reviewed journal with a wide-ranging coverage, consolidating research activities in all areas of nanoscience and nanotechnology into a single and unique reference source. JNN is the first cross-disciplinary journal to publish original full research articles, rapid communications of important new scientific and technological findings, timely state-of-the-art reviews with author's photo and short biography, and current research news encompassing the fundamental and applied research in all disciplines of science, engineering and medicine.
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