The Sub-Micron Hole Array in Sapphire Produced by Inductively-Coupled Plasma Reactive Ion Etching

Authors: Shiao, Ming-Hua; Chang, Chun-Ming; Huang, Su-Wei; Lee, Chao-Te; Wu, Tzung-Chen; Hsueh, Wen-Jeng; Ma, Kung-Jeng; Chiang, Donyau

Source: Journal of Nanoscience and Nanotechnology, Volume 12, Number 2, February 2012 , pp. 1641-1644(4)

Publisher: American Scientific Publishers

Buy & download fulltext article:

Price: $113.00 plus tax (Refund Policy)

Abstract:

The sub-micron hole array in a sapphire substrate was fabricated by using nanosphere lithography (NSL) combined with inductively-coupled-plasma reactive ion etching (ICP-RIE) technique. Polystyrene nanospheres of about 600 nm diameter were self-assembled on c-plane sapphire substrates by the spin-coating method. The diameter of polystyrene nanosphere was modified by using oxygen plasma in ICP-RIE system. The size of nanosphere modified by oxygen plasma was varied from 550 to 450 nm with different etching times from 15 to 35 s. The chromium thin film of 100 nm thick was then deposited on the shrunk nanospheres on the substrate by electron-beam evaporation system. The honeycomb type chromium mask can be obtained on the sapphire substrate after the polystyrene nanospheres were removed. The substrate was further etched in two sets of chlorine/Argon and boron trichloride/Argon mixture gases at constant pressure of 50 mTorr in ICP-RIE processes. The 400 nm hole array in diameter can be successfully produced under suitable boron trichloride/Argon gas flow ratio.

Keywords: AL2O3; SUB-MICRON HOLE ARRAY; ICP-RIE; POLYSTYRENE NANOSPHERE

Document Type: Research article

DOI: http://dx.doi.org/10.1166/jnn.2012.4694

Publication date: 2012-02-01

More about this publication?

Journal for Nanoscience and Nanotechnology (JNN) is an international and multidisciplinary peer-reviewed journal with a wide-ranging coverage, consolidating research activities in all areas of nanoscience and nanotechnology into a single and unique reference source. JNN is the first cross-disciplinary journal to publish original full research articles, rapid communications of important new scientific and technological findings, timely state-of-the-art reviews with author's photo and short biography, and current research news encompassing the fundamental and applied research in all disciplines of science, engineering and medicine.
Editorial Board
Information for Authors
Subscribe to this Title
Terms & Conditions
ingentaconnect is not responsible for the content or availability of external websites

The Sub-Micron Hole Array in Sapphire Produced by Inductively-Coupled Plasma Reactive Ion Etching

Buy & download fulltext article:

Tools

Key

Text size:

Useful pages