Silicon thin film was formed by dropping silicon ink on a single-crystalline silicon substrate and further annealing. The effects of the annealing conditions on the microstructures of thin film were investigated in order to obtain a crystalline silicon thin film for application in the
field of printable electronics. Silicon ink was prepared by dispersing silicon nanoparticles synthesized using inductive coupled plasma in a solvent, namely, propylene glycol. The silicon nanoparticles in the as-synthesized film were observed to melt at a temperature of less than 1000 °C,
and a highly crystalline silicon thin film was obtained by annealing at 800 °C for 180 min.
Journal for Nanoscience and Nanotechnology (JNN) is an international and multidisciplinary peer-reviewed journal with a wide-ranging coverage, consolidating research activities in all areas of nanoscience and nanotechnology into a single and unique reference source. JNN is the first cross-disciplinary journal to publish original full research articles, rapid communications of important new scientific and technological findings, timely state-of-the-art reviews with author's photo and short biography, and current research news encompassing the fundamental and applied research in all disciplines of science, engineering and medicine.