If you are experiencing problems downloading PDF or HTML fulltext, our helpdesk recommend clearing your browser cache and trying again. If you need help in clearing your cache, please click here . Still need help? Email firstname.lastname@example.org
We have investigated a novel method for patterning of (3, 4-ethylenedioxythiophene) PEDOT, which has involved a selective polymerization of PEDOT on an UV-activated Self-Assembled-Monolayer surface. OTS coated surface has been activated by UV exposure, and the UV-exposed area served
as adsorption sites for FeCl3 oxidants, providing a selective deposition of PEDOT films on FeCl3 adsorbed area, and thus leading to the selective patterning of PEDOT films. UV irradiation time and mask pattern dimension are main contributors to patternability: UV irradiation
through Cr-mask (3 μm design) lead to approximately 3–5 μm patterns of PEDOT films, depending on the UV exposure time. In addition, a scotch tape peel test revealed excellent adhesion property of PEDOT to SiO2. Consequently, this simple method can be applied
to define deep submicron dimensions due to its ability of providing a direct transfer of mask patterns to the substrate.
Journal for Nanoscience and Nanotechnology (JNN) is an international and multidisciplinary peer-reviewed journal with a wide-ranging coverage, consolidating research activities in all areas of nanoscience and nanotechnology into a single and unique reference source. JNN is the first cross-disciplinary journal to publish original full research articles, rapid communications of important new scientific and technological findings, timely state-of-the-art reviews with author's photo and short biography, and current research news encompassing the fundamental and applied research in all disciplines of science, engineering and medicine.