Nanoporous Ti-Metal Film Deposition Using Radio Frequency Magnetron Sputtering Technique for Photovoltaic Application
Nanoporous Ti-metal film electrode was fabricated by radio frequency (rf) magnetron sputtering technique on nanoporous TiO2 layer prepared by sol–gel combustion method and investigated with respect to its photo-anode properties of TCO-less DSCs. The porous Ti layer (∼1 μm) with low sheet resistance (∼17 Ω/sq.) can collect electrons from the TiO2 layer and allows the ionic diffusion of I −/I 3 − through the hole. The porous Ti layer with highly ordered columnar structure prepared by 8 mTorr sputtering shows the good impedance characteristics. The efficiency of prepared TCO-less DSCs sample is about 4.83% (ff: 0.6, V oc : 0.65 V, J sc: 11.2 mA/cm2).
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Document Type: Research Article
Publication date: 2012-02-01
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