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Nanoporous Ti-Metal Film Deposition Using Radio Frequency Magnetron Sputtering Technique for Photovoltaic Application

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Nanoporous Ti-metal film electrode was fabricated by radio frequency (rf) magnetron sputtering technique on nanoporous TiO2 layer prepared by sol–gel combustion method and investigated with respect to its photo-anode properties of TCO-less DSCs. The porous Ti layer (∼1 μm) with low sheet resistance (∼17 Ω/sq.) can collect electrons from the TiO2 layer and allows the ionic diffusion of I /I 3 through the hole. The porous Ti layer with highly ordered columnar structure prepared by 8 mTorr sputtering shows the good impedance characteristics. The efficiency of prepared TCO-less DSCs sample is about 4.83% (ff: 0.6, V oc : 0.65 V, J sc: 11.2 mA/cm2).
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Keywords: NANOPOROUS FILM; RF MAGNETRON SPUTTERING; TCO-LESS DSCS; TI-LAYER ELECTRODE

Document Type: Research Article

Publication date: 2012-02-01

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  • Journal for Nanoscience and Nanotechnology (JNN) is an international and multidisciplinary peer-reviewed journal with a wide-ranging coverage, consolidating research activities in all areas of nanoscience and nanotechnology into a single and unique reference source. JNN is the first cross-disciplinary journal to publish original full research articles, rapid communications of important new scientific and technological findings, timely state-of-the-art reviews with author's photo and short biography, and current research news encompassing the fundamental and applied research in all disciplines of science, engineering and medicine.
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