Macroscopic and Microscopic Investigation on Chemical Mechanical Polishing of Sapphire Wafer
Authors: Lee, Hyunseop; Lee, Hojun; Jeong, Hobin; Choi, Sungha; Lee, Youngkyun; Jeong, Moonki; Jeong, Haedo
Source: Journal of Nanoscience and Nanotechnology, Volume 12, Number 2, February 2012 , pp. 1256-1259(4)
Publisher: American Scientific Publishers
Abstract:Sapphire (α-Al2O3) is an important ceramic material that is widely used in substrate material for electronics. We investigate the chemical reaction layer on a sapphire wafer using X-ray photoelectron microscopy (XPS) and atomic force microscopy (AFM). The frictional characteristics of sapphire chemical mechanical polishing (CMP) was studied using in-situ friction force monitoring system. From XPS analysis and AFM experiment, a chemically-reacted layer was verified on the sapphire surface through a chemical reaction between the sapphire and chemicals in a slurry. During sapphire CMP, the friction force mainly depended on the applied pressure. The material removal efficiency per unit friction energy in sapphire CMP was 6.18 nm/kJ.
Document Type: Research Article
Publication date: 2012-02-01
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