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Fabrication of Nano Patterns on Various Substrates Using Nanosphere Lithography Technique

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This paper presents a procedure for fabricating large-area, size-tunable, metal arrays with a periodically different shape using Nanosphere Lithography (NSL). This technique has attracted considerable interest because of its important applications as diffraction devices, chemical and optical data recording. Their ordered arrays can be used for anti-reflection surfaces, bio-sensors and nanopatterning masks. Two different types of patterns, honeycomb and hexagonal patterns, could be fabricated on various substrates with different procedures. All steps for making different patterns employed a PS (polystyrene) monolayer by spin coating. Honeycomb patterns were fabricated by spin coating a PS monolayer on a glass substrate and depositing a metal followed by removal of the monolayer, whereas the hexagonal pattern was produced by the transfer of a gold deposited monolayer onto a GaN substrate using the same process. These processes allow simple and excellent control of the size and shape of the patterns. All experimental results on structure characterization and determination of the nanoparticle metrics were accomplished by atomic force microscopy and field emission-scanning electronic microscopy.
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Document Type: Research Article

Publication date: 2012-02-01

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  • Journal for Nanoscience and Nanotechnology (JNN) is an international and multidisciplinary peer-reviewed journal with a wide-ranging coverage, consolidating research activities in all areas of nanoscience and nanotechnology into a single and unique reference source. JNN is the first cross-disciplinary journal to publish original full research articles, rapid communications of important new scientific and technological findings, timely state-of-the-art reviews with author's photo and short biography, and current research news encompassing the fundamental and applied research in all disciplines of science, engineering and medicine.
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