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Electrical and Optical Properties of NiO Composite Films by Radio Frequency Magnetron Sputtering

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The 100-nm NiO–Ag composite films with Ag content of 0 to 24.4 at.% are deposited on glass substrates. It is found that an ultra high electric resistivity (ρ) value is obtained and cannot be detected by four point probe measurement when the Ag content is less than 3.4 at.%. The ρ value is reduced significantly to 29.0 Ω-cm as Ag content is increased to 4.2 at.%, and it decreases greatly to 0.009 Ω-cm as the content of Ag is further increased to 24.4 at.%. The NiO–Ag composite film with Ag content of 4.2 at.% shows p-type conduction. However, it becomes n-type when the Ag content increases to 9.3 at.%, which results from the Ag atoms segregated at grain boundary of NiO when the excess Ag atoms are added into NiO films. On the other hand, the transmittance of the NiO–Ag films drops continuously from 96.3% to 31.6% as the Ag content increases from 0 to 24.4%.
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Keywords: ELECTRICAL AND OPTICAL PROPERTIES; NIO-AG COMPOSITE FILMS; RF SPUTTERING

Document Type: Research Article

Publication date: 2012-02-01

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  • Journal for Nanoscience and Nanotechnology (JNN) is an international and multidisciplinary peer-reviewed journal with a wide-ranging coverage, consolidating research activities in all areas of nanoscience and nanotechnology into a single and unique reference source. JNN is the first cross-disciplinary journal to publish original full research articles, rapid communications of important new scientific and technological findings, timely state-of-the-art reviews with author's photo and short biography, and current research news encompassing the fundamental and applied research in all disciplines of science, engineering and medicine.
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