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Influence of Interface Layers on Ag Thin Film Growth

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We prepared Ag thin films on SiO2/Si substrates, with and without a subnanometer-thick organic interface layer of 3-mercaptopropyltrimethoxysilane (MPTMS). The surface morphology and electrical resistivity of these films were investigated and compared. Ag films grown with an MPTMS layer were relatively flat, resulting in a smaller critical thickness. This was probably because migration of Ag atoms on the substrate was suppressed by interactions between the Ag atoms and the thiol moiety. The deposition rate and terminating group of the organic interface layer also influenced the Ag film growth.
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Keywords: AG THIN FILM; INTERFACE LAYER; MPTMS; RESISTIVITY

Document Type: Research Article

Publication date: 01 February 2012

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  • Journal for Nanoscience and Nanotechnology (JNN) is an international and multidisciplinary peer-reviewed journal with a wide-ranging coverage, consolidating research activities in all areas of nanoscience and nanotechnology into a single and unique reference source. JNN is the first cross-disciplinary journal to publish original full research articles, rapid communications of important new scientific and technological findings, timely state-of-the-art reviews with author's photo and short biography, and current research news encompassing the fundamental and applied research in all disciplines of science, engineering and medicine.
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