A Critical Appraisal of the Nanoindentation Creep 'Nose' Effect in Ni Thin Films
The creep behaviour of polycrystal Ni thin films under the same maximum load (P max = 8000 μN) and different unloading periods (ranging from 1 to 250 s) has been investigated at room temperature using nanoindentation tests. A 'nose' has been observed in the unloading segment of the loadpenetration depth curve when the holding time at peak load is short and/or the unloading rate is small, and when the peak load is sufficient high. When a 'nose' presents, the apparent unloading stiffness S u, defined as dP/dh, is negative, and the reduced modulus can no longer be calculated from the Oliver-Pharr method. Taking such uncertainties into account, a critical appraisal is proposed for ranking creep propensities exhibited during nanoindentation under specified conditions.
No Reference information available - sign in for access.
No Citation information available - sign in for access.
No Supplementary Data.
Document Type: Research Article
Publication date: 2012-02-01
More about this publication?
- Journal for Nanoscience and Nanotechnology (JNN) is an international and multidisciplinary peer-reviewed journal with a wide-ranging coverage, consolidating research activities in all areas of nanoscience and nanotechnology into a single and unique reference source. JNN is the first cross-disciplinary journal to publish original full research articles, rapid communications of important new scientific and technological findings, timely state-of-the-art reviews with author's photo and short biography, and current research news encompassing the fundamental and applied research in all disciplines of science, engineering and medicine.
- Editorial Board
- Information for Authors
- Subscribe to this Title
- Terms & Conditions
- Ingenta Connect is not responsible for the content or availability of external websites