Fabrication of Ferromagnetic Nanoconstriction Using Atomic Force Microscopy Nanoscratching

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Abstract:

Nanolithography used in conjunction with atomic force microscopy (AFM) has attracted considerable attention as a technique for fabricating nanoscale structures. To obtain nanostructures and devices, AFM nanoscratching was performed on a photoresist and on NiFe at various values of the applied force, scan speed, and number of scan cycles. The scratching process was carried out using a diamond-coated tip on NiFe and a Si tip on the photoresist. By conducting scratching processes on NiFe and on the photoresist, we investigated the dependence of the size of the scratched part on the scratching parameters. These results show that the width and depth of the scratched part increase as the applied force and number of scan cycles increase, but not as the scan speed increases. This means that it is possible to control the size of the scratched parts by adjusting the applied force and number of scan cycles. AFM nanoscratching was then used to directly fabricate a nanoconstricted area with a width of 139 nm and a cross-sectional area of less than 300 nm2 was fabricated.

Keywords: ATOMIC FORCE MICROSCOPY; FERROMAGNETIC THIN FILM; NANOCONSTRICTION; NANOSCRATCH LITHOGRAPHY

Document Type: Research Article

DOI: http://dx.doi.org/10.1166/jnn.2011.4052

Publication date: December 1, 2011

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  • Journal for Nanoscience and Nanotechnology (JNN) is an international and multidisciplinary peer-reviewed journal with a wide-ranging coverage, consolidating research activities in all areas of nanoscience and nanotechnology into a single and unique reference source. JNN is the first cross-disciplinary journal to publish original full research articles, rapid communications of important new scientific and technological findings, timely state-of-the-art reviews with author's photo and short biography, and current research news encompassing the fundamental and applied research in all disciplines of science, engineering and medicine.
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