Microstructure and Crystallization Kinetics Analysis of the (In15Sb85)100−x Zn x Phase Change Recording Thin Films
The (In15Sb85)100−x Zn x films (x = 0 ∼ 17.4) were deposited on nature oxidized Si wafer and glass substrate at room temperature by magnetron co-sputtering of Sb target and InZn composite target. The thermal property of the films was examined by a homemade reflectivity thermal analyzer. Microstructures of the films were analyzed by transmission electron microscope (TEM). We examined the effects of Zn addition on the thermal property, crystallization kinetics, and crystallization mechanism of the In15Sb85 recording film. As x = 0 ∼ 17.4, thermal analysis shows that the (In15Sb85)100−x Znx films have two phase transition temperature ranges which are 189 °C∼215 °C and 300 °C∼350 °C. It is found that the activation energy is increased with Zn content. This indicates that the thermal stability of amorphous state is improved by doping Zn. The optical contrasts of the films are all larger than 15%, as x = 0 ∼ 6.2, indicating that the films have the potential in blue laser optical recording media application.
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Document Type: Research Article
Publication date: 2011-12-01
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