Fabrication and Characterization of Silicon Quantum Dots in Si-Rich Silicon Carbide Films
Amorphous Si-rich silicon carbide films were prepared by magnetron co-sputtering and subsequently annealed at 900–1100 °C. After annealing at 1100 °C, this configuration of silicon quantum dots embedded in amorphous silicon carbide formed. X-ray photoelectron spectroscopy was used to study the chemical modulation of the films. The formation and orientation of silicon quantum dots were characterized by glancing angle X-ray diffraction, which shows that the ratio of silicon and carbon significantly influences the species of quantum dots. High-resolution transmission electron microscopy investigations directly demonstrated that the formation of silicon quantum dots is heavily dependent on the annealing temperatures and the ratio of silicon and carbide. Only the temperature of about 1100 °C is enough for the formation of high-density and small-size silicon quantum dots due to phase separation and thermal crystallization. Deconvolution of the first order Raman spectra shows the existence of a lower frequency peak in the range 500–505 cm−1corresponding to silicon quantum dots with different atom ratio of silicon and carbon.
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Document Type: Research Article
Publication date: 2011-12-01
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