Authors: Chatruprachewin, Santi; Supadee, Laddawan; Titiroongruang, Wisut

Source: Journal of Nanoscience and Nanotechnology, Volume 11, Number 12, December 2011 , pp. 10579-10583(5)

Publisher: American Scientific Publishers

Abstract:

Due to the current requirement of high recording density of hard disk drive, the thickness of DLC layer which is the protective layer is needed to be reduced. Therefore, the corrosion of read-write elements that are fabricated from soft magnetic materials is more critical. During the photolithography process, polymer photoresist is playing the major role on controlling the corrosion of soft magnetic materials. Two different types of polymer photoresists are selected to investigate, noted as wet photoresist and dry photoresist, respectively. Contact angle measurement, AFM and SEM are techniques using to determine the quality of polymer photoresists. Furthermore, the direct corrosion is also studied by using potentiostat/galvanostat-based measurements. The result suggested that the wet photoresist, AZ4999 Clariant, is better as compared to that of dry photoresist. No surface degradation as well as surface defects of the wet photoresist was found after lithography process. The corrosion rate of the specimen coated by this corresponding wet film is found to be only 1.44 × 10⁻⁶ mm/y. In addition, the wet photoresist surface is hydrophobic posed of more than 75 degree of contact angle.

Keywords: DATA STORAGE; PHOTORESIST FILM; SOFT MAGNETIC; POLARIZATION; CORROSION

Document Type: Research article

DOI: http://dx.doi.org/10.1166/jnn.2011.4034

Publication date: 2011-12-01

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