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Cross-Section Control of Stacked Nanowires Formed by Bosch Process and Oxidation

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The cross-sectional shape of the stacked silicon nanowires (SiNWs) formed by the Bosch process and stress-limited oxidation is studied in this paper. Under the condition of high temperature oxidation, the resulting nanowires highly resemble the initial shapes resulting by the Bosch process. The effects of etching and passivation in the Bosch process are modeled to provide a guideline to control the cross-section of the stacked nanowires.
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Keywords: BOSCH PROCESS; NANO-TRANSISTOR; NANOWIRE; STRESS LIMITED OXIDATION

Document Type: Research Article

Publication date: 2011-12-01

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  • Journal for Nanoscience and Nanotechnology (JNN) is an international and multidisciplinary peer-reviewed journal with a wide-ranging coverage, consolidating research activities in all areas of nanoscience and nanotechnology into a single and unique reference source. JNN is the first cross-disciplinary journal to publish original full research articles, rapid communications of important new scientific and technological findings, timely state-of-the-art reviews with author's photo and short biography, and current research news encompassing the fundamental and applied research in all disciplines of science, engineering and medicine.
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