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Silicon Precipitation via Photoinduced Reaction Using Femtosecond Laser

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Abstract:

Silicon precipitation inside a glass is an important technique for silicon photonics. We successfully precipitated silicon inside silicate glasses containing an Al metal film using femtosecond laser irradiation. First, the Al-inserted sandwiched glass was fabricated by the direct bonding method. The results of a tensile test indicated that the adhesive strength of the sandwich structure reached approximately 4 MPa. Next, femtosecond laser pulses were focused at the Al/glass interface in the sandwich structure. A transmission electron microscopy photograph at the focus of the laser showed that the Al particles were dispersed into the glass substrate to a depth of ∼2 μm from the initial Al layer. In addition, Raman spectra indicated that silicon had formed at the interface between the glass and Al film after the laser irradiation. The morphology or the particle size of the precipitated silicon was successfully modified by changing the repetition rate or the pulse energy of the laser.

Keywords: DIRECT BONDING; FEMTOSECOND LASER; PHOTO-INDUCED REACTION; RAMAN SPECTROSCOPY; SILICON

Document Type: Research Article

DOI: https://doi.org/10.1166/jnn.2011.4988

Publication date: 2011-11-01

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  • Journal for Nanoscience and Nanotechnology (JNN) is an international and multidisciplinary peer-reviewed journal with a wide-ranging coverage, consolidating research activities in all areas of nanoscience and nanotechnology into a single and unique reference source. JNN is the first cross-disciplinary journal to publish original full research articles, rapid communications of important new scientific and technological findings, timely state-of-the-art reviews with author's photo and short biography, and current research news encompassing the fundamental and applied research in all disciplines of science, engineering and medicine.
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