Nanosecond Field-Induced Quenching of the Luminescence from Er-Doped Silicon Nanocrystals

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Abstract:

Er-doped Si-rich SiO2 gate oxide layers containing silicon nanocrystals are prepared by implantation of Si+ and Er+ into SiO2 thin films. The photoluminescence from both Si nanocrystals around 700–850 nm and Er3+ ions at 1.54 μm is strongly quenched by applying electric field in the Si-rich oxide layer. The quenching time and the recovery time of the photoluminescence from Si nanocrystals are less than 50 ns under pulsed field modulation. The quenching rate of the luminescence increases with increasing the density and reducing the size of the silicon nanocrystals. Our results indicate that the fast quenching process originates from the quantum confined Stark effect and enhanced exciton ionization by carrier tunneling between the silicon nanocrystals under the high electric field.

Keywords: ER-DOPED SILICON NANOCRYSTALS; EXCITON IONIZATION; FIELD-INDUCED QUENCHING; PHOTOLUMINESCENCE; STARK EFFECT

Document Type: Research Article

DOI: http://dx.doi.org/10.1166/jnn.2011.5283

Publication date: November 1, 2011

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  • Journal for Nanoscience and Nanotechnology (JNN) is an international and multidisciplinary peer-reviewed journal with a wide-ranging coverage, consolidating research activities in all areas of nanoscience and nanotechnology into a single and unique reference source. JNN is the first cross-disciplinary journal to publish original full research articles, rapid communications of important new scientific and technological findings, timely state-of-the-art reviews with author's photo and short biography, and current research news encompassing the fundamental and applied research in all disciplines of science, engineering and medicine.
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