An Effect of Silicon Micro-/Nano-Patterning Arrays on Superhydrophobic Surface
Superhydrophobic surface can be fabricated by creating a rough surface at very fine scale and modify it with low-surface energy material. To obtain the optimum superhydrophobicity, the surface roughness must be maximized. To avoid the limitation of scaling down the pattern size by using an expensive lithography tools, the surface roughness factor (r) was increased by means of changing an asperity shape so as to increase its overall surface area. In this paper, the patterns of the asperities under studied were wave stripes, line stripes, cylindrical pillars, square pillars, pentagonal pillars, hexagonal pillars, and octagonal pillars. All pillar shapes were arranged in square arrays, hexagonal arrays, and continuous stripes. The asperities sizes and the pitches were varied from 1 to 5 μm with 10 μm of asperity height. Then the patterned surfaces were coated with polydimethylsiloxane mixed with 10 wt% dicumylperoxide. It was found that the stripe asperities can generate only hydrophobic surface with water contact angle (WCA) of 135° to 145°. The pillars with square and hexagonal arrays had the WCA of 149° to 158°. The pentagonal pillars with square and hexagonal arrays achieved the highest WCA with an average WCA of 156°. It was evident that the pillar shape had significant effect on the superhydrophobicity.
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Document Type: Research Article
Publication date: 2011-10-01
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